光学精密工程2017，Vol.25Issue(12)：2975-2985,11.DOI:10.3788/OPE.20172512.2975
超精密外差利特罗式光栅干涉仪位移测量系统
A displacement measurement system for ultra-precision heterodyne Littrow grating interferometer
摘要
Abstract
The ultra-precision displacement measurement was researched for the work table of a Scanning Beam Interference Lithography (SBIL) tool to improve its environmental robustness.For the displacement measuring requirement of the work table of the SBIL tool,a novel heterodyne Littrow Grating Interferometer (GI)displacement measurement system with high environmental robustness was proposed.The measuring principle of the heterodyne Littrow grating interferometer was introduced,and the design of the system and dead path error modeling method based on Elden equation was performed.An integrated mini grating interferometer with a size of 48 mm×48 mm× 18 mm was fabricated.Then,the dead path error of the system was calculated based on the model.The calculation result indicates that the dead path error caused by a relative large environmental fluctuation (temperature fluctuation in (干)0.01 ℃,pressure fluctuation in ±7.5 Pa,humidity fluctuation in (干)1.5％,andCO2 content fluctuation in ±50× 10-6) is only ±0.05 nm.Finally,a comparison system based on the commercial plane mirror interferometer (PMI) and GI was designed for the principle verification and measurement stability experiment.The principle verification demonstrates that the principle of the system is right and the resolution reaches to 0.41 nm.The measurement stability experiment shows that the dead path error of GI and PMI caused by the environmental fluctuation are respectively 7.59nm (3σ)@＜0.9 Hz&1～10 Hz and 31.11 nm (3σ)@＜0.9 Hz&1～10 Hz in a conventional laboratory environment,which indicates the environmental robustness of the GI is higher than that of the PMI.关键词
扫描干涉光刻/位移测量/光栅干涉仪/外差干涉仪/环境鲁棒性Key words
scanning beam interference lithography/displacement measurement/grating interferometer/heterodyne interferometer/environmental robustness分类
机械制造引用本文复制引用
王磊杰,张鸣,朱煜,鲁森,杨开明..超精密外差利特罗式光栅干涉仪位移测量系统[J].光学精密工程,2017,25(12):2975-2985,11.基金项目
国家自然科学基金资助项目(No.51677104) （No.51677104）
中国博士后科学基金资助项目(No.2017M610885) （No.2017M610885）
