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基于柔性纳米压印工艺制备中红外双层金属纳米光栅

褚金奎 康维东 曾祥伟 张然

光学精密工程2017,Vol.25Issue(12):3034-3040,7.
光学精密工程2017,Vol.25Issue(12):3034-3040,7.DOI:10.3788/OPE.20172512.3034

基于柔性纳米压印工艺制备中红外双层金属纳米光栅

Fabrication of bilayer metallic nano gratings in mid-infrared region based on flexible nanoimprint lithography

褚金奎 1康维东 1曾祥伟 1张然1

作者信息

  • 1. 大连理工大学机械工程学院辽宁省微系统研究中心重点实验室,辽宁大连116024
  • 折叠

摘要

Abstract

In nanoimprint lithography of infrared metallic gratings,the grating structure is easily damaged by hard template nanoimprint lithography and their polarization characteristics would be reduced.This paper proposes a flexible nanoimprint lithography as the alternative method to fabricate the bilayer metallic nano grating with a height of 100 nm and a thickness of 40 nm.The grating is suitable for working at 3-5μm and its main parameters are the period in 200 nm,line width in 100 nm,and the aspect ratio in 1 ∶ 1.In fabrication,the master template grating structure was copied to the Intermediate PloymerSheet (IPS) material by thermal nanoimprint lithography to obtain IPS soft template for the embossing.Then,the IPS grating structure was transferred to the STU-7 resist by UV-embossing lithography to get the dielectric grating with complete and uniform structure.Finally,Al was deposited on this grating by vertical thermal evaporation,and the mid-infrared bilayer metallic nano grating was successfully fabricated.The fabricated grating was tested.The results show that the transverse magnetic transmittance of this mid-infrared bilayer metallic nano grating is greater than 70% in the 2.5-5 μm,and its extinction ratio is more than 30 dB in the 2.7-5μm,especially it is greater than 35 dB in the 2.72-3.93 μm,showing excellent extinction ratio and polarization characteristics.These results demonstrate that the grating fabricated here has potential applications in infrared polarization detection and infrared polarization sensing.

关键词

纳米光栅/中红外光栅/金属光栅/柔性纳米压印/IPS(Intermediate PloymerSheet)/热蒸镀

Key words

nano grating/mid-infrared grating/metallic grating/flexible nanoimprint lithography/IPS(Intermediate PloymerSheet)/thermal evaporation

分类

信息技术与安全科学

引用本文复制引用

褚金奎,康维东,曾祥伟,张然..基于柔性纳米压印工艺制备中红外双层金属纳米光栅[J].光学精密工程,2017,25(12):3034-3040,7.

基金项目

国家自然科学基金资助项目(No.51675076,No.51505062) (No.51675076,No.51505062)

国家自然科学基金创新研究群体项目(No.51621064) (No.51621064)

中央高校基本科研业务费(No.DUT17GF109,DUT16TD20) (No.DUT17GF109,DUT16TD20)

联合基金资助项目(6141B08100303) (6141B08100303)

光学精密工程

OA北大核心CSCDCSTPCD

1004-924X

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