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等离子物理气相沉积热障涂层研究进展

石佳 魏亮亮 张宝鹏 高丽华 郭洪波 宫声凯 徐惠彬

航空材料学报2018,Vol.38Issue(2):1-9,9.
航空材料学报2018,Vol.38Issue(2):1-9,9.DOI:10.11868/j.issn.1005-5053.2018.001008

等离子物理气相沉积热障涂层研究进展

Research Process in Plasma Spray Physical Vapor Deposited Thermal Barrier Coatings

石佳 1魏亮亮 1张宝鹏 1高丽华 1郭洪波 1宫声凯 2徐惠彬1

作者信息

  • 1. 北京航空航天大学 材料科学与工程学院,北京 100191
  • 2. 高温结构材料与涂层技术工业和信息化部重点实验室,北京 100191
  • 折叠

摘要

Abstract

Plasma spray physical vapor deposition (PS-PVD) is a newly developed processing technology for advanced functional coatings and films. PS-PVD is featured with the advantages of plasma spray (PS) and physical vapor deposition (PVD) and can be used for high efficient co-deposition of vapor phases, liquid droplets and solid particles, with the capability of highly flexibility in building up various microstructure architectures. Besides, uniform deposition of the coatings or films can be achieved by this technology even on the non-line-of-sight areas of those components with complex geometry. Owing to the above merits, PS-PVD shows very promising potential in the fields of thermal barrier coatings (TBCs), environmental barrier coatings (EBCs), super-hard and wear-resistant coatings or films, oxygen permeable membranes and electrode membranes. Further, PS-PVD is recognized as the processing technology for advanced TBCs in the future. In this paper, physical principles and recent research progress in preparation and deposition mechanisms of PS-PVD TBCs are briefly introduced and summarized. The future development trends of PS-PVD in new thermal barrier coatings are prospected.

关键词

等离子物理气相沉积(PS-PVD)/热障涂层/工艺/沉积机理

Key words

PS-PVD/thermal barrier coatings (TBCs)/processing/deposition mechanisms

分类

矿业与冶金

引用本文复制引用

石佳,魏亮亮,张宝鹏,高丽华,郭洪波,宫声凯,徐惠彬..等离子物理气相沉积热障涂层研究进展[J].航空材料学报,2018,38(2):1-9,9.

基金项目

国家自然基金(51590894,51425102,51231001) (51590894,51425102,51231001)

航空材料学报

OA北大核心CSCDCSTPCD

1005-5053

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