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Studies on morphology, electrical and optical characteristics of Al-doped ZnO thin films grown by atomic layer deposition

Li Chen Xinliang Chen Zhongxin Zhou Sheng Guo Ying Zhao Xiaodan Zhang

半导体学报（英文版）2018，Vol.39Issue(3)：19-24,6.

半导体学报（英文版）2018，Vol.39Issue(3)：19-24,6.DOI:10.1088/1674-4926/39/3/033004

Studies on morphology, electrical and optical characteristics of Al-doped ZnO thin films grown by atomic layer deposition

Li Chen ¹Xinliang Chen ²Zhongxin Zhou ³Sheng Guo ¹Ying Zhao ²Xiaodan Zhang³

作者信息

1. Institute of Photo-Electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China
2. Tianjin Key Laboratory of Photo-Electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China
3. Key Laboratory of Opto-Electronic Information Science and Technology for Ministry of Education, Nankai University,Tianjin 300071, China
折叠

摘要

关键词

AZO films/ALD/Zn ∶ Al cycle ratio/optical and electrical properties

Key words

AZO films/ALD/Zn ∶ Al cycle ratio/optical and electrical properties

引用本文复制引用

Li Chen,Xinliang Chen,Zhongxin Zhou,Sheng Guo,Ying Zhao,Xiaodan Zhang..Studies on morphology, electrical and optical characteristics of Al-doped ZnO thin films grown by atomic layer deposition[J].半导体学报（英文版）,2018,39(3):19-24,6.

基金项目

Project supported by the State Key Development Program for Basic Research of China (Nos.2011CBA00706,2011CBA00707) and the Tianjin Applied Basic Research Project and Cutting-Edge Technology Research Plan (No.13JCZDJC26900). （Nos.2011CBA00706,2011CBA00707）

半导体学报（英文版）

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ISSN：1674-4926

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