红外与毫米波学报2018，Vol.37Issue(1)：11-14,4.DOI:10.11972/j.issn.1001-9014.2018.01.003
锗薄膜在低温下的折射率研究
Refractive index of Ge film at low temperature
摘要
Abstract
Germanium (Ge) films with physical thickness of 1600nm was deposited on ZnSe substrates by an electron beam evaporation system.The transmittance of Ge film in the range of 2 to 15 μm was measured by a PerkinElmer FTIR cryogenic testing system from 80 K to 300 K with a step length of 20 K.Then,the relationship between the refractive index and wavelength in the 2 ～ 12 μm region at different temperatures was obtained by the full spectrum inversion method fitting.It can be seen that the relationship confirms to the Cauchy formula.The relationship between the refractive index of Ge film and the temperature / wavelength can be expressed as n(λ,T) =3.29669 +0.000 15T + 5.968 34 × 10-6T2 0.41698/λ2 +0.17384/λ4,which was obtained by the fitting method based on the Cauchy formula.Finally,the accuracy of the formula was verified by comparing the theoretical value obtained by the formula with the measured result.关键词
Ge膜/红外光学薄膜/折射率温度系数Key words
infrared film/Ge film/refractive index分类
数理科学引用本文复制引用
徐嶺茂,周晖,张凯锋,郑军,李坤,王济洲,王多书..锗薄膜在低温下的折射率研究[J].红外与毫米波学报,2018,37(1):11-14,4.基金项目
Supported by National Defense Basic Research Project (A0320133002),Science and Technology on Vacuum Technology and Physics Laboratory for the Research Project (6142207040104) （A0320133002）
