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太赫兹InP基InAlAs/InGaAs PHEMTs的研制

王志明 黄辉 胡志富 赵卓彬 崔玉兴 孙希国 李亮 付兴昌 吕昕

红外与毫米波学报2018,Vol.37Issue(2):135-139,5.
红外与毫米波学报2018,Vol.37Issue(2):135-139,5.DOI:10.11972/j.issn.1001-9014.2018.02.002

太赫兹InP基InAlAs/InGaAs PHEMTs的研制

Design and realization of THz InAlAs/InGaAs InP-based PHEMTs

王志明 1黄辉 2胡志富 3赵卓彬 1崔玉兴 3孙希国 3李亮 3付兴昌 3吕昕1

作者信息

  • 1. 北京理工大学毫米波与太赫兹技术北京市重点实验室,北京 100081
  • 2. 中国计量科学研究院,北京 100029
  • 3. 河北半导体研究所,河北石家庄 050051
  • 折叠

摘要

Abstract

In this paper,90-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors(PHEMTs)with well-balanced cut-off frequency ftand maximum oscillation frequency fmaxare reported.This device with a gate-width of 2×25 μm shows excellent DC characteristics, including a maximum saturation current density Idssof 894 mA/mm,and a maximum extrinsic transconductance gm,maxof 1 640 mS/mm. The off-state breakdown voltage(BVoff-state)defined at a gate current of 1mA/mm is 3.3 V.The RF measurement is carried out covering the full frequency range from 1 to 110 GHz,an extrapolated ftof 252 GHz and fmaxof 394 GHz are obtained,respectively.These results are obtained by the combination of gate size scaling, parasitics re-duction and the on-wafer measurement in the full frequency band from 1 to 110 GHz.

关键词

磷化铟/赝配高电子迁移率晶体管/InAlAs/InGaAs/在片测试/单片集成电路

Key words

InP/PHEMTs/InAlAs/InGaAs/on-wafer measurement/monolithic microwave integrated circuits(MMICs)

分类

信息技术与安全科学

引用本文复制引用

王志明,黄辉,胡志富,赵卓彬,崔玉兴,孙希国,李亮,付兴昌,吕昕..太赫兹InP基InAlAs/InGaAs PHEMTs的研制[J].红外与毫米波学报,2018,37(2):135-139,5.

基金项目

Supported by National Natural Science Foundation of China(61275107) (61275107)

红外与毫米波学报

OA北大核心CSCDCSTPCDSCI

1001-9014

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