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Influence of deposition rate on the structural, optical and electrical properties of electron beam evaporated SnO2 thin films for transparent conducting electrode applications

Nitin Kumar Bhawana Joshi K.Asokan

半导体学报（英文版）2018，Vol.39Issue(8)：20-26,7.

半导体学报（英文版）2018，Vol.39Issue(8)：20-26,7.DOI:10.1088/1674-4926/39/8/083002

Influence of deposition rate on the structural, optical and electrical properties of electron beam evaporated SnO2 thin films for transparent conducting electrode applications

Nitin Kumar ¹Bhawana Joshi ¹K.Asokan²

作者信息

1. Department of Applied Physics, Gautam Buddha University, Greater Noida-201310, India
2. Materials Science Division, Inter University Accelerator Centre, New Delhi-110067, India
折叠

摘要

关键词

SnO2/oxygen vacancies/carrier concentration/deposition rate/electron beam evaporation

Key words

SnO2/oxygen vacancies/carrier concentration/deposition rate/electron beam evaporation

引用本文复制引用

Nitin Kumar,Bhawana Joshi,K.Asokan..Influence of deposition rate on the structural, optical and electrical properties of electron beam evaporated SnO2 thin films for transparent conducting electrode applications[J].半导体学报（英文版）,2018,39(8):20-26,7.

基金项目

One of the author (N.Kumar) gratefully acknowledges the support from IUAC,New Delhi. （N.Kumar）

半导体学报（英文版）

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ISSN：1674-4926

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