半导体学报（英文版）2018，Vol.39Issue(9)：1-7,7.DOI:10.1088/1674-4926/39/9/093001
Solution flow rate influence on ZnS thin films properties grown by ultrasonic spray for optoelectronic application
Solution flow rate influence on ZnS thin films properties grown by ultrasonic spray for optoelectronic application
A.Derbali 1H.Saidi 1A.Attaf 1H.Benamra 1A.Bouhdjer 1N.Attaf 2H.Ezzaouia 3L.Derbali 3M.S.Aida4
作者信息
- 1. Laboratory of Thin Films and Applications LPCMA, University of Biskra, Algeria, BP 145 RP, 07000 Biskra, Algérie
- 2. Laboratoire de Couches Minces et Interfaces Faculté des Sciences Université de Constantine, Algeria
- 3. Laboratory of Semiconductors, Nanostructures and Advanced Technology(LSNTA), Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95, 2050 Hammam-Lif, Tunisia
- 4. Department of Physics Faculty of Sciences, King Abdulaziz University, Djeddah, KSA
- 折叠
摘要
关键词
zinc sulphide/X-ray diffraction/ultrasonic spray/solution flow rate/optical and electrical propertiesKey words
zinc sulphide/X-ray diffraction/ultrasonic spray/solution flow rate/optical and electrical properties引用本文复制引用
A.Derbali,H.Saidi,A.Attaf,H.Benamra,A.Bouhdjer,N.Attaf,H.Ezzaouia,L.Derbali,M.S.Aida..Solution flow rate influence on ZnS thin films properties grown by ultrasonic spray for optoelectronic application[J].半导体学报（英文版）,2018,39(9):1-7,7.
