金刚石与磨料磨具工程2018，Vol.38Issue(6)：69-72,4.DOI:10.13394/j.cnki.jgszz.2018.6.0013
Chemical-mechanically polishing large area free-standing CVD diamond films
Chemical-mechanically polishing large area free-standing CVD diamond films
ZHANG Pingwei 1TONG Tingting 2CAI Yunhong1
作者信息
- 1. Hebei Plasma Diamond Technology Co ., Ltd ., Shijiazhuang 050000 ,China
- 2. Hebei Institute o f L aser , Shijiazhuang 050000 ,China
- 折叠
摘要
关键词
polishing plate/oxidizing agent/material removal rate/surface roughnessKey words
polishing plate/oxidizing agent/material removal rate/surface roughness分类
矿业与冶金引用本文复制引用
ZHANG Pingwei,TONG Tingting,CAI Yunhong..Chemical-mechanically polishing large area free-standing CVD diamond films[J].金刚石与磨料磨具工程,2018,38(6):69-72,4.
