光学精密工程2019，Vol.27Issue(1)：129-136,8.DOI:10.3788/OPE.20192701.0129
无基膜高深宽比双面集成微结构元件的制作
Fabrication of two-sided integrated microstructure element with high aspect ratio and without film substrate
摘要
Abstract
Two-sided integrated microstructure elements are increasingly used in the fields of integrated optical imaging and beam shaping.Aimed at resolving the difficulties of fabricating two-sided integrated microstructure elements with integral materials and high aspect ratio structures, a new method was proposed that was an improved ultraviolet imprint technology for fabricating two-sided integrated microstructure elements with high aspect ratios and without a film substrate.By applying this method, integrated light guide plate samples were successfully produced without film substrates and with high aspect ratios.The microstructures on the top and bottom surfaces of the samples were in agreement with the metal modules, within the margin of error, meaning that structural deformation was small in the imprint copying process.Moreover, the integrated light guide plate samples were unbending and of integrally even thickness.The experimental results show that the improved ultraviolet imprint technology can be used to fabricate two-sided integrated microstructure elements with high aspect ratios and without film substrates.This technique is applicable to the fabrication of optical ele-ments with functionalities suitable for integrated optical imaging, beam shaping, light diffusion, light guiding, and light concentration.关键词
two-sided integrated/without film substrate/high aspect ratio/ultraviolet imprintKey words
two-sided integrated/without film substrate/high aspect ratio/ultraviolet imprint分类
数理科学引用本文复制引用
徐平,黄燕燕,张旭琳,杨伟,彭文达..无基膜高深宽比双面集成微结构元件的制作[J].光学精密工程,2019,27(1):129-136,8.基金项目
国家自然科学基金资助项目(No.61275167) （No.61275167）
深圳市知识创新计划重点资助项目(No.JCYJ20140418095735591,No.JCYJ20130329103020637 （）
