首页|期刊导航|半导体学报（英文版）|Recent advances in lithographic fabrication of micro-/nanostructured polydimethylsiloxanes and their soft electronic applications

Recent advances in lithographic fabrication of micro-/nanostructured polydimethylsiloxanes and their soft electronic applications

Donghwi Cho Junyong Park Taehoon Kim Seokwoo Jeon

半导体学报（英文版）2019，Vol.40Issue(11)：48-65,18.

半导体学报（英文版）2019，Vol.40Issue(11)：48-65,18.DOI:10.1088/1674-4926/40/11/111605

Recent advances in lithographic fabrication of micro-/nanostructured polydimethylsiloxanes and their soft electronic applications

Donghwi Cho ¹Junyong Park ²Taehoon Kim ¹Seokwoo Jeon³

作者信息

1. Department of Materials Science and Engineering, KAIST Institute for the NanoCentury, Korea Advanced Institute of Science and Technology(KAIST), Daejeon 34141, Republic of Korea
2. School of Materials Science and Engineering, Kumoh National Institute of Technology, Gumi, Gyeongbuk 39177, Republic of Korea
3. Department of Biomedical Engineering, Tufts University, Medford, Massachusetts, 02155, USA
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摘要

关键词

lithographic technique/microstructure/nanostructure/polydimethylsiloxane/soft electronics

Key words

lithographic technique/microstructure/nanostructure/polydimethylsiloxane/soft electronics

引用本文复制引用

Donghwi Cho,Junyong Park,Taehoon Kim,Seokwoo Jeon..Recent advances in lithographic fabrication of micro-/nanostructured polydimethylsiloxanes and their soft electronic applications[J].半导体学报（英文版）,2019,40(11):48-65,18.

基金项目

This research was supported by the National Research Foundation (NRF) of Korea funded by the Ministry of Science and ICT and Future Planning (MSIP) (2016R1E1A1A01943131). （NRF）

半导体学报（英文版）

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ISSN：1674-4926

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