无机材料学报2020，Vol.35Issue(7)：839-846,8.DOI:10.15541/jim20190380
Z型BiVO4/GO/g-C3N4复合材料的制备及其可见光下催化性能
Fabrication of Z-scheme BiVO4/GO/g-C3N4 Photocatalyst with Efficient Visble-light Photocatalytic Performance
摘要
Abstract
Fabricating Z-scheme photocatalysts is a promising method for improving photocatalytic activity by ef-fectively enhancing charge separation. A new Z-scheme BiVO4/GO/g-C3N4 photocatalyst was prepared by two steps of impregnation-calcination and hydrothermal method, and then characterized by different methods. In the photo-catalytic process of BiVO4/GO/g-C3N4, GO nanosheet act as fast transmission channels between BiVO4 and g-C3N4 and can suppress electron-hole recombination, which significantly promotes the charge separation and improves the redox ability of the ternary heterojunction. The ternary photocatalyst has good photocatalytic degradation of Rho-damine B (RhB) as compared to the single-component or binary composite. It is capable of degrading 85％ of RhB in 120 min under visible light irradiation and the hole (h+) plays a major role in the reaction. This work provides a simple preparation method for a ternary photocatalyst system in which g-C3N4 coupled with BiVO4 by GO to sig-nificantly improve photocatalytic activity.关键词
BiVO4/g-C3N4/GO/三元催化剂/Z型异质结Key words
BiVO4/g-C3N4/GO/ternary photocatalyst/Z-scheme heterojunction分类
通用工业技术引用本文复制引用
许世超,朱天哲,乔阳,白学健,唐楠,郑春明..Z型BiVO4/GO/g-C3N4复合材料的制备及其可见光下催化性能[J].无机材料学报,2020,35(7):839-846,8.基金项目
National Natural Science Foundation of China (51772208, 51678409) （51772208, 51678409）
Natural Science Foundation of Tianjin (17JCYBJC15900) （17JCYBJC15900）
