新型炭材料2020，Vol.35Issue(3)：193-208,16.DOI:10.1016/S1872-5805(20)60484-X
低温CVD法制备石墨烯的研究进展
A review of graphene synthesis at low temperatures by CVD methods
摘要
Abstract
Chemical vapor deposition (CVD) is the most effective method for the synthesis of large-scale and high-quality graphene.However,the growth temperature of graphene is high,about 1 000 ℃,using conventional CVD,meaning that it is expensive and thus limits the use of the material.The synthesis of CVD graphene at low temperatures (＜600 ℃) is therefore the focus of many researchers.Recent research on the production of CVD graphene at low temperatures is reviewed.Comprehensive comparison,analysis and discussion of quality,number of layers,domain size and the uses of graphene synthesized at low temperatures using different precursors (gas,liquid and solids) and substrates (metals,metal alloys and dielectric materials) are given for different CVD methods (atmospheric pressure CVD,plasma enhanced CVD,catalyst-enhanced CVD,surface wave plasma CVD,microwave plasma CVD,radio frequency plasma enhanced CVD and electron cyclotron resonance CVD).The future prospects and challenges of preparing graphene at low temperatures are discussed.关键词
石墨烯/低温/化学气相沉积Key words
Graphene/Low temperature/CVD分类
化学化工引用本文复制引用
王佳斌,任壮,侯莹,闫晓丽,刘培植,张华,章海霞,郭俊杰..低温CVD法制备石墨烯的研究进展[J].新型炭材料,2020,35(3):193-208,16.基金项目
国家自然科学基金(51701137,51703150) （51701137,51703150）
山西省自然科学基金(201701D121043) （201701D121043）
山西省高等学校科技创新项目(2019L0253).National Natural Science Foundation of China(51701137,51703150),Natural Science Foundation of Shanxi Province(201701D121043),Scientific and Technological Innovation Programs of Higher Education Institutions in Shanxi (STIP) (2019L0253). （2019L0253）
