Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties
Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties
摘要
关键词
Chiral semiconductor/Nanowires/Nanoimprinting/Strain engineering/Optical propertyKey words
Chiral semiconductor/Nanowires/Nanoimprinting/Strain engineering/Optical property引用本文复制引用
Yixiu Wang,Shengyu Jin,Qingxiao Wang,Min Wu,Shukai Yao,Peilin Liao,Moon J. Kim,Gary J. Cheng,Wenzhuo Wu..Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties[J].纳微快报（英文）,2020,12(11):242-254,13.基金项目
W.Z.W.acknowledges the College of Engi-neering and School of Industrial Engineering at Purdue Univer-sity for startup support.W.Z.W.was partially supported by the National Science Foundation under Grant CMMI-1762698.G.J.C.acknowledges financial assistance from ONR NEPTUNE program National Science Foundation under Grant CMMI-1538360.Q.W.and M.J.K.were supported by the Louis Beecherl,Jr.Endowment Funds.P.L.Acknowledges the College of Engineering and School of Materials Engineering at Purdue University for startup support.The computational research was supported through computational resources provided by the Information Technology department at Purdue University.The authors gratefully acknowledge the sup-port and help from Professor Alexander Wei and his group in the LB assembly. （）
