中南民族大学学报（自然科学版）2021，Vol.40Issue(1)：57-63,7.DOI:10.12130/znmdzk.20210110
磁控溅射沉积镓掺杂氧化锌薄膜的微观结构性质研究(英文)
Gallium-incorporated zinc oxide films deposited by magnetron sputtering and its microstructural properties
摘要
Abstract
Transparent conductive gallium-doped zinc oxide thin films were deposited by magnetron sputtering technique onto glass substrates.The crystallinity and microstructural properties of the deposited samples were investigated by means of X-ray diffractometer and quantitative analysis. The results show that all the samples are polycrystalline with a hexagonal wurtzite structure and grow preferentially in the(002) direction.The microstructure parameters such as lattice constants, interplanar spacing and Zn-O bond length were determined and the results are in agreement with that of the standard ZnO. When the film thickness is 570 nm,the deposited sample exhibits the best crystal quality and microstructural properties,with the maximum( 002) texture coefficient and mean crystal size,and the minimum lattice strain and dislocation density.关键词
磁控溅射/掺杂氧化锌/薄膜/微观结构Key words
magnetron sputtering/doped zinc oxide/thin film/microstructure分类
信息技术与安全科学引用本文复制引用
顾锦华,朱雅,康淮..磁控溅射沉积镓掺杂氧化锌薄膜的微观结构性质研究(英文)[J].中南民族大学学报（自然科学版）,2021,40(1):57-63,7.基金项目
湖北省自然科学基金资助项目(2011CDB418) （2011CDB418）
