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Heavily doped silicon:A potential replacement of conventional plasmonic metals

Omar Faruque Rabiul Al Mahmud Rakibul Hasan Sagor

半导体学报(英文版)2021,Vol.42Issue(6):37-42,6.
半导体学报(英文版)2021,Vol.42Issue(6):37-42,6.DOI:10.1088/1674-4926/42/6/062302

Heavily doped silicon:A potential replacement of conventional plasmonic metals

Heavily doped silicon:A potential replacement of conventional plasmonic metals

Omar Faruque 1Rabiul Al Mahmud 1Rakibul Hasan Sagor1

作者信息

  • 1. Islamic University of Technology(IUT),Board Bazar Gazipur,Gazipur 1704,Bangladesh
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摘要

关键词

alternative plasmonic material/heavily doped p-silicon/surface plasmon polaritons

Key words

alternative plasmonic material/heavily doped p-silicon/surface plasmon polaritons

引用本文复制引用

Omar Faruque,Rabiul Al Mahmud,Rakibul Hasan Sagor..Heavily doped silicon:A potential replacement of conventional plasmonic metals[J].半导体学报(英文版),2021,42(6):37-42,6.

半导体学报(英文版)

OACSCDCSTPCDEI

1674-4926

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