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Fully Printed High-Performance n-Type Metal Oxide Thin-Film Transistors Utilizing Coffee-Ring Effect

Kun Liang Siyuan Zhu Pei Sheng Wenbin Li Xiao Lin Bowen Zhu Dingwei Li Huihui Ren Momo Zhao Hong Wang Mengfan Ding Guangwei Xu Xiaolong Zhao Shibing Long

纳微快报(英文)2021,Vol.13Issue(11):68-78,11.
纳微快报(英文)2021,Vol.13Issue(11):68-78,11.

Fully Printed High-Performance n-Type Metal Oxide Thin-Film Transistors Utilizing Coffee-Ring Effect

Fully Printed High?Performance n?Type Metal Oxide Thin?Film Transistors Utilizing Coffee?Ring Effect

Kun Liang 1Siyuan Zhu 2Pei Sheng 3Wenbin Li 3Xiao Lin 1Bowen Zhu 4Dingwei Li 5Huihui Ren 1Momo Zhao 4Hong Wang 1Mengfan Ding 2Guangwei Xu 1Xiaolong Zhao 2Shibing Long1

作者信息

  • 1. Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province,School of Engineering,Westlake University,Hangzhou 310024,China
  • 2. Zhejiang University,Hangzhou 310027,China
  • 3. Instrumentation and Service Center for Physical Sciences,Westlake University,Hangzhou 310024,China
  • 4. Institute of Advanced Technology,Westlake Institute for Advanced Study,Hangzhou 310024,China
  • 5. School of Science,Westlake University,Hangzhou 310024,China
  • 折叠

摘要

Abstract

Metal oxide thin-films transistors (TFTs) pro duced from solution-based printing techniques can lead to large-area electronics with low cost. However, the performance of current printed devices is inferior to those from vacuum-based methods due to poor film uniformity induced by the "coffeering" effect. Here, we report a novel approach to print highperformance indium tin oxide (ITO)-based TFTs and logic inverters by taking advantage of such notorious effect. ITO has high electrical conductivity and is generally used as an electrode material. However, by reducing the film thickness down to nanometers scale, the carrier concentration of ITO can be effectively reduced to enable new applications as active channels in transistors. The ultrathin (~10-nm-thick) ITO film in the center of the coffee-ring worked as semiconducting channels, while the thick ITO ridges (>18-nm-thick) served as the contact electrodes. The fully inkjet-printed ITO TFTs exhibited a high saturation mobility of 34.9 -cm2 -V?1 -s?1 and a low subthreshold swing of 105 mV -dec?1. In addition, the devices exhibited excellent electrical stability under positive bias illumination stress (PBIS, ΔVth = 0.31 V) and negative bias illuminaiton stress (NBIS,ΔVth = ?0.29 V) after 10,000 s voltage bias tests. More remarkably, fully printed n-type metal–oxide–semiconductor (NMOS) inverter based on ITO TFTs exhibited an extremely high gain of 181 at a low-supply voltage of 3 V, promising for advanced electronics applications.

关键词

Printed electronics/Indium tin oxide/Thin-film transistors/Coffee-ring effect/NMOS inverters

Key words

Printed electronics/Indium tin oxide/Thin-film transistors/Coffee-ring effect/NMOS inverters

引用本文复制引用

Kun Liang,Siyuan Zhu,Pei Sheng,Wenbin Li,Xiao Lin,Bowen Zhu,Dingwei Li,Huihui Ren,Momo Zhao,Hong Wang,Mengfan Ding,Guangwei Xu,Xiaolong Zhao,Shibing Long..Fully Printed High-Performance n-Type Metal Oxide Thin-Film Transistors Utilizing Coffee-Ring Effect[J].纳微快报(英文),2021,13(11):68-78,11.

基金项目

This research was financially supported&nbsp ()

under the Westlake Multidisciplinary Research Initiative Center&nbsp ()

(MRIC)Seed Fund(Grant No.MRIC20200101).This work was&nbsp (MRIC)

performed in part at the Westlake Center for Micro/Nano Fabrica-tion and the Instrumentation and Service Center for Physical Sci-ences(ISCPS),Westlake University.B.Z.thanks Prof.Yang Yang,&nbsp (ISCPS)

UCLA,for discussion and suggestions.The authors acknowledge&nbsp ()

Dr.Taofei Zhou,Dr.Xiaohe Miao,and Dr.Lin Liu of ISCPS,and&nbsp ()

Mr.Danyang Zhu of Westlake University for technical assistance. ()

纳微快报(英文)

OACSCDEISCI

2311-6706

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