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考虑背栅电流的DSOI MOSFET阈值电压模型研究

王可为 卜建辉 韩郑生 李博 黄杨 罗家俊 赵发展

原子能科学技术2021,Vol.55Issue(12):2224-2230,7.
原子能科学技术2021,Vol.55Issue(12):2224-2230,7.DOI:10.7538/yzk.2021.youxian.0548

考虑背栅电流的DSOI MOSFET阈值电压模型研究

Threshold Voltage Model for DSOI MOSFET Considering Back-gate Current

王可为 1卜建辉 2韩郑生 3李博 1黄杨 2罗家俊 1赵发展2

作者信息

  • 1. 中国科学院微电子研究所,北京100029
  • 2. 中国科学院硅器件重点实验室,北京100029
  • 3. 中国科学院大学,北京100029
  • 折叠

摘要

Abstract

The relationship between the threshold voltage and the back-gate voltage of fully depleted DSOI NMOS is no longer satisfied with a single linear relationship after high total dose irradiation or high back-gate voltage.The coupling mechanism between the threshold voltage and the back-gate voltage will change after the back surface of the fully depleted DSOI device changes from the depletion region to the reversion region.Previous model is not enough to describe this phenomenon.In order to solve this prob-lem,a new threshold voltage model was proposed considering the influence of back-gate current.The coupling relationship between the threshold voltage and back-gate voltage of the devices suffered from a high back-gate voltage or high total dose irradiation can be well fitted.

关键词

DSOI/FDSOI/总剂量效应/阈值电压/背栅电压

Key words

DSOI/FDSOI/total ionizing dose effect/threshold voltage/back-gate voltage

分类

化学化工

引用本文复制引用

王可为,卜建辉,韩郑生,李博,黄杨,罗家俊,赵发展..考虑背栅电流的DSOI MOSFET阈值电压模型研究[J].原子能科学技术,2021,55(12):2224-2230,7.

基金项目

Supported by Youth Innovation Promotion Association CAS (2020119),National Natural Science Foundation of China(61874135,62011530040) (2020119)

原子能科学技术

OA北大核心CSCDCSTPCD

1000-6931

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