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首页|期刊导航|光:科学与应用(英文版)|Optical Anisotropy in van der Waals materials:Impact on Direct Excitation of Plasmons and Photons by Quantum Tunneling

Optical Anisotropy in van der Waals materials:Impact on Direct Excitation of Plasmons and Photons by Quantum Tunneling

Zhe Wang Vijith Kalathingal Thanh Xuan Hoang Hong-Son Chu Christian A.Nijhuis

光:科学与应用(英文版)2021,Vol.10Issue(12):2387-2398,12.
光:科学与应用(英文版)2021,Vol.10Issue(12):2387-2398,12.

Optical Anisotropy in van der Waals materials:Impact on Direct Excitation of Plasmons and Photons by Quantum Tunneling

Optical Anisotropy in van der Waals materials:Impact on Direct Excitation of Plasmons and Photons by Quantum Tunneling

Zhe Wang 1Vijith Kalathingal 1Thanh Xuan Hoang 2Hong-Son Chu 3Christian A.Nijhuis4

作者信息

  • 1. Department of Chemistry,National University of Singapore,3 Science Drive 3,Singapore 117543,Singapore
  • 2. Centre for Advanced 2D Materials,National University of Singapore,6 Science Drive 2,Singapore 117564,Singapore
  • 3. Department of Electrical and Computer Engineering,National University of Singapore,4 Engineering Drive 3,Singapore 117583,Singapore
  • 4. Department of Electronics and Photonics,Institute of High Performance Computing,A*STAR(Agency for Science,Technology and Research),1 Fusionopolis Way,Singapore 138632,Singapore
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摘要

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Zhe Wang,Vijith Kalathingal,Thanh Xuan Hoang,Hong-Son Chu,Christian A.Nijhuis..Optical Anisotropy in van der Waals materials:Impact on Direct Excitation of Plasmons and Photons by Quantum Tunneling[J].光:科学与应用(英文版),2021,10(12):2387-2398,12.

基金项目

The authors acknowledge the National Research Foundation(NRF)for supporting this research under the Prime Minister's Office,Singapore,under its Medium Sized Centre Programme and the Competitive Research Programme(CRP)(NRF-CRP17-2017-08).The authors also thank the Centre for Advanced 2D Materials(CA2DM)for the provided facilities.H.S.C and T.X.H acknowledge the support of the A*STAR Computational Resource Centre through access to high-performance computing facilities. (NRF)

光:科学与应用(英文版)

OACSCDCSTPCD

2095-5545

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