首页|期刊导航|半导体学报(英文版)|Investigation into the InAs/GaAs quantum dot material epitaxially grown on silicon for O band lasers
半导体学报(英文版)2022,Vol.43Issue(1):55-61,7.DOI:10.1088/1674-4926/43/1/012301
Investigation into the InAs/GaAs quantum dot material epitaxially grown on silicon for O band lasers
Investigation into the InAs/GaAs quantum dot material epitaxially grown on silicon for O band lasers
摘要
关键词
semiconductor laser/molecular beam epitaxy/quantum dots/Ⅲ-Ⅴ on Si/silicon photonicsKey words
semiconductor laser/molecular beam epitaxy/quantum dots/Ⅲ-Ⅴ on Si/silicon photonics引用本文复制引用
Tianyi Tang,Tian Yu,Guanqing Yang,Jiaqian Sun,Wenkang Zhan,Bo Xu,Chao Zhao,Zhanguo Wang..Investigation into the InAs/GaAs quantum dot material epitaxially grown on silicon for O band lasers[J].半导体学报(英文版),2022,43(1):55-61,7.基金项目
This work was supported by the National Key Research and Development Program of China (Grant No.2018YFB2200104),the "Strategic Priority Research Program"of the Chinese Academy of Sciences (Grant No.XDB43010102),and the Frontier Science Key Research Pro-gram of CAS (Grant No.QYZDB-SSW-SLH006).Prof.Bo Xu thanks Prof.Jinsong Xia from Huazhong University of Sci-ence and Technology for growing Ge layers on Si. (Grant No.2018YFB2200104)