首页|期刊导航|极端条件下的物质与辐射（英文）|Simultaneous high-resolution x-ray backlighting and self-emission imaging for laser-produced plasma diagnostics using a two-energy multilayer Kirkpatrick–Baez microscope

Simultaneous high-resolution x-ray backlighting and self-emission imaging for laser-produced plasma diagnostics using a two-energy multilayer Kirkpatrick–Baez microscope

S.Z.Yi J.Q.Dong L.Jiang Q.S.Huang E.F.Guo Wang Z.S.

极端条件下的物质与辐射（英文）2022，Vol.7Issue(1)：P.47-52,6.

极端条件下的物质与辐射（英文）2022，Vol.7Issue(1)：P.47-52,6.DOI:10.1063/5.0062758

Simultaneous high-resolution x-ray backlighting and self-emission imaging for laser-produced plasma diagnostics using a two-energy multilayer Kirkpatrick–Baez microscope

S.Z.Yi ¹J.Q.Dong ²L.Jiang ¹Q.S.Huang ¹E.F.Guo ²Wang Z.S.¹

作者信息

1. MOE Key Laboratory of Advanced Micro-Structured Materials,No.1239 Siping Road,Shanghai 200092,China School of Physics Science and Engineering,Tongji University,Shanghai 200092,China
2. Shanghai Institute of Laser Plasma,CAEP,P.O.Box 919-988,Shanghai 201800,China
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摘要

关键词

method./multilayer/resolution

分类

数理科学

引用本文复制引用

S.Z.Yi,J.Q.Dong,L.Jiang,Q.S.Huang,E.F.Guo,Wang Z.S...Simultaneous high-resolution x-ray backlighting and self-emission imaging for laser-produced plasma diagnostics using a two-energy multilayer Kirkpatrick–Baez microscope[J].极端条件下的物质与辐射（英文）,2022,7(1):P.47-52,6.

基金项目

supported by National MCF Energy R&D Program(Grant No.2019YFE03080200) （Grant No.2019YFE03080200）

the National Natural Science Foundation of China(Grant No.11805212) （Grant No.11805212）

the Fundamental Research Funds for the Central Universities(Grant No.22120200405). （Grant No.22120200405）

极端条件下的物质与辐射（英文）

OACSCD

ISSN：2468-2047

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