Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility
Peng Yang Zhengbao Yang Ye Chen Dong-Keun Ki Juin J.Liou Wugang Liao Chaoliang Tan Jiajia Zha Guoyun Gao Long Zheng Haoxin Huang Yunpeng Xia Songcen Xu Tengfei Xiong Zhuomin Zhang
Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility
Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility
摘要
关键词
Chemical vapor deposition/Substrate engineering/Tellurium/Field-effect transistors/Hole mobilityKey words
Chemical vapor deposition/Substrate engineering/Tellurium/Field-effect transistors/Hole mobility引用本文复制引用
Peng Yang,Zhengbao Yang,Ye Chen,Dong-Keun Ki,Juin J.Liou,Wugang Liao,Chaoliang Tan,Jiajia Zha,Guoyun Gao,Long Zheng,Haoxin Huang,Yunpeng Xia,Songcen Xu,Tengfei Xiong,Zhuomin Zhang..Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility[J].纳微快报(英文),2022,14(7):43-54,12.基金项目
This work is supported by the financial sup-ports from National Natural Science Foundation of China(Grant No.61904110)and Young Teachers'Startup Fund for Scientific Research of Shenzhen University(Grant No.860-000002110426).C.T.thanks the funding support from the National Natural Science Foundation of China(52122002),the Start-Up Grant(Project No.9610495)from City University of Hong Kong and ECS scheme(CityU 21201821)from the Research Grant Council of Hong Kong.We thank Instrument Analysis Center of Shenzhen University for the assistance with TEM analysis.Open access funding provided by Shanghai Jiao Tong University. (Grant No.61904110)