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Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Zhuofei Gan Hongtao Feng Liyang Chen Siyi Min Chuwei Liang Menghong Xu Zijie Jiang Zhao Sun Chuying Sun Dehu Cui Wen-Di Li

光：科学与应用（英文版）2022，Vol.11Issue(5)：P.832-841,10.

光：科学与应用（英文版）2022，Vol.11Issue(5)：P.832-841,10.DOI:10.1038/s41377-022-00774-z

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Zhuofei Gan ¹Hongtao Feng ²Liyang Chen ²Siyi Min ²Chuwei Liang ²Menghong Xu ²Zijie Jiang ²Zhao Sun ²Chuying Sun ²Dehu Cui ³Wen-Di Li²

作者信息

1. Department of Mechanical Engineering,University of Hong Kong,Hong Kong,China School of Microelectronics,Southern University of Science and Technology,Shenzhen,China
2. Department of Mechanical Engineering,University of Hong Kong,Hong Kong,China
3. School of Microelectronics,Southern University of Science and Technology,Shenzhen,China
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摘要

关键词

lithography/dimensions/spatially

分类

通用工业技术

引用本文复制引用

Zhuofei Gan,Hongtao Feng,Liyang Chen,Siyi Min,Chuwei Liang,Menghong Xu,Zijie Jiang,Zhao Sun,Chuying Sun,Dehu Cui,Wen-Di Li..Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure[J].光：科学与应用（英文版）,2022,11(5):P.832-841,10.

基金项目

partially supported by the Research Grants Council of the Hong Kong Special Administrative Region(Awards no.17207419,17209320,C7018-20G,and AoE/P-701/20) （Awards no.17207419,17209320,C7018-20G,and AoE/P-701/20）

the Platform Technology Funding program,and the Seed Funding Program for Basic Research(202011159235 and 202010160046) （202011159235 and 202010160046）

the University of Hong Kong,and Shenzhen Government(Grant no.K20799112). （Grant no.K20799112）

光：科学与应用（英文版）

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ISSN：2095-5545

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