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Interfacial dynamics of GaP/Si(100)heterostructure grown by molecular beam epitaxy

Tieshi Wei Xuefei Li Zhiyun Li Wenxian Yang Yuanyuan Wu Zhiwei Xing Shulong Lu

半导体学报（英文版）2022，Vol.43Issue(12)：33-39,7.

半导体学报（英文版）2022，Vol.43Issue(12)：33-39,7.DOI:10.1088/1674-4926/43/12/122101

Interfacial dynamics of GaP/Si(100)heterostructure grown by molecular beam epitaxy

Tieshi Wei ¹Xuefei Li ²Zhiyun Li ¹Wenxian Yang ³Yuanyuan Wu ¹Zhiwei Xing ¹Shulong Lu¹

作者信息

1. Key Laboratory of Nanodevices and Applications,Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China
2. Nano Science and Technology Institute,University of Science and Technology of China,Suzhou 215123,China
3. Vacuum Interconnected Nanotech Workstation(NANO-X),Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China
折叠

摘要

关键词

XPS/interfacial dynamics/GaP/Si(100)heterostructure/MBE

Key words

XPS/interfacial dynamics/GaP/Si(100)heterostructure/MBE

引用本文复制引用

Tieshi Wei,Xuefei Li,Zhiyun Li,Wenxian Yang,Yuanyuan Wu,Zhiwei Xing,Shulong Lu..Interfacial dynamics of GaP/Si(100)heterostructure grown by molecular beam epitaxy[J].半导体学报（英文版）,2022,43(12):33-39,7.

基金项目

This work is supported in part by the National Key R&D Program(Grant No.2018YFB2003305),the National Natural Sci-ence Foundation of China(Grant Nos.61774165,61704186,and 61827823),and the program from SINANO(Y8AAQ11003 and Y4JAQ21005).We are thankful for the technical support from Nano Fabrication Facility,Platform for Characteriza-tion&Test,and Vacuum Interconnected Nanotech Worksta-tion of SINANO,CAS. （Grant No.2018YFB2003305）

半导体学报（英文版）

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ISSN：1674-4926

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