首页|期刊导航|光：科学与应用（英文版）|Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus
光：科学与应用（英文版）2022，Vol.11Issue(12)：3028-3043,16.
Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus
Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus
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Zhaoqing Li,Olivier Allegre,Lin Li..Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus[J].光：科学与应用（英文版）,2022,11(12):3028-3043,16.基金项目
The authors would like to thank Prof.Mark Dickinson for lending a spatial light modulator(SLM),Dr.Alexander Oh for lending some of the optical and motion control elements,Prof.Dun Liu and Dr.Qianliang Li for focused ion beam(FIB)equipment usage support.The authors are also grateful to the Chinese Academy of Science Ningbo Institute of Materials Technology and Engineering and the Experimental Center for Advanced Manufacturing and Technology in the School of Mechanical Science&Engineering of Huazhong University of Science and Technology for the access to their FIB facilities. （SLM）
