Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
Fukang Deng Jianhong Wei Yadong Xu Zhiqiang Lin Xi Lu Yan-Jun Wan Rong Sun Ching-Ping Wong Yougen Hu
纳微快报(英文)2023,Vol.15Issue(7):278-292,15.
纳微快报(英文)2023,Vol.15Issue(7):278-292,15.
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
摘要
关键词
2D transition metal dichalcogenides/2H-TaS2/Flexibility/Electromagnetic interference shieldingKey words
2D transition metal dichalcogenides/2H-TaS2/Flexibility/Electromagnetic interference shielding引用本文复制引用
Fukang Deng,Jianhong Wei,Yadong Xu,Zhiqiang Lin,Xi Lu,Yan-Jun Wan,Rong Sun,Ching-Ping Wong,Yougen Hu..Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding[J].纳微快报(英文),2023,15(7):278-292,15.基金项目
The authors gratefully acknowledge the financial supports by the National Natural Science Foundation of China(62074154),Shenzhen Science and Technology Program(JCYJ20210324102208023,JSGG20210802153000002). (62074154)