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首页|期刊导航|纳微快报(英文)|Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding

Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding

Fukang Deng Jianhong Wei Yadong Xu Zhiqiang Lin Xi Lu Yan-Jun Wan Rong Sun Ching-Ping Wong Yougen Hu

纳微快报(英文)2023,Vol.15Issue(7):278-292,15.
纳微快报(英文)2023,Vol.15Issue(7):278-292,15.

Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding

Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding

Fukang Deng 1Jianhong Wei 2Yadong Xu 1Zhiqiang Lin 1Xi Lu 1Yan-Jun Wan 1Rong Sun 1Ching-Ping Wong 3Yougen Hu1

作者信息

  • 1. Shenzhen Institute of Advanced Electronic Materials,Shenzhen Institute of Advanced Technology,Chinese Academy of Sciences,Shenzhen 518055,People's Republic of China
  • 2. Shenzhen Institute of Advanced Electronic Materials,Shenzhen Institute of Advanced Technology,Chinese Academy of Sciences,Shenzhen 518055,People's Republic of China||Shenzhen Geim Graphene Center,Institute of Materials Research,Shenzhen International Graduate School,Tsinghua University,Shenzhen 518055,People's Republic of China
  • 3. School of Materials Science and Engineering,Georgia Institute of Technology,Atlanta,GA 30332,USA
  • 折叠

摘要

关键词

2D transition metal dichalcogenides/2H-TaS2/Flexibility/Electromagnetic interference shielding

Key words

2D transition metal dichalcogenides/2H-TaS2/Flexibility/Electromagnetic interference shielding

引用本文复制引用

Fukang Deng,Jianhong Wei,Yadong Xu,Zhiqiang Lin,Xi Lu,Yan-Jun Wan,Rong Sun,Ching-Ping Wong,Yougen Hu..Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding[J].纳微快报(英文),2023,15(7):278-292,15.

基金项目

The authors gratefully acknowledge the financial supports by the National Natural Science Foundation of China(62074154),Shenzhen Science and Technology Program(JCYJ20210324102208023,JSGG20210802153000002). (62074154)

纳微快报(英文)

OACSCDCSTPCDEI

2311-6706

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