中南民族大学学报（自然科学版）2023，Vol.42Issue(6)：809-818,10.DOI:10.20056/j.cnki.ZNMDZK.20230612
沉积功率对溅射制备镓镁共掺杂氧化锌薄膜光学和电学性能的影响
Influence of deposition power on the optical and electrical performance of sputtered gallium-magnesium co-doped zinc oxide thin films
摘要
Abstract
The transparent conductor thin films of gallium-magnesium co-doped zinc oxide(ZnO:Ga-Mg)were deposited by magnetron-sputtering process.The deposition power dependence of structural,morphological,optical and electrical properties of the thin film was characterized by various techniques.The experimental results indicate that all the thin films have hexagonal wurtzite structure with highly c-axis preferred orientation along the(002)plane,and the deposition power strongly affects the properties of ZnO:Ga-Mg thin films.The thin film prepared at the deposition power of 150 W exhibits the best crystallinity quality and photoelectric properties,with the highest average visible transmittance of 92.2%,the lowest resistivity of 1.18×10-3 Ω∙cm,the maximum figure of merit of 1.04×104 Ω-1∙cm-1,and the minimum lattice strain of 1.95×10-3 and dislocation density of 1.17×1015 m-2.The optical constants of the thin films were obtained by the optical characterization methods.The optical dispersion behavior of the thin films was studied in terms of the single-oscillator Wemple-DiDomenico(WDD)model,and the oscillator parameters,non-linear optical constants and optical energy-gaps were achieved.The results demonstrate that the deposition power is one of the most important processing parameters to affect the structure,optical and electrical properties of ZnO:Ga-Mg thin films.关键词
氧化锌/薄膜/掺杂/光电性能Key words
ZnO/thin films/doping/photoelectric properties分类
信息技术与安全科学引用本文复制引用
钟志有,万鑫,顾锦华,龙浩,杨春勇,陈首部..沉积功率对溅射制备镓镁共掺杂氧化锌薄膜光学和电学性能的影响[J].中南民族大学学报（自然科学版）,2023,42(6):809-818,10.基金项目
国家自然科学基金资助项目(12075322) （12075322）
中南民族大学实验室研究资助项目(SYYJ2022008) （SYYJ2022008）
