沈阳大学学报（自然科学版）2023，Vol.35Issue(6)：459-463,470,6.
光栅阀角度对电弧离子镀TiN薄膜结构及性能的影响
Effect of Grating Valve Angle on Structure and Properties of Arc Ion Plated TiN Films
赵彦辉 1杨文进1
作者信息
- 1. 中国科学院金属研究所材料表面工程研究部,辽宁 沈阳 110016
- 折叠
摘要
Abstract
By adjusting the grating valve angle,studies on the structure and mechanical properties of TiN films deposited by arc ion plating were performed.The experimental results showed that the grating valve angle had no significant effect on the preferred orientation of TiN film,the films showed TiN(200)preferred orientation.With the increase of grating angle valve,N and Ti atomic percent content ratio in TiN films were substoichiometric,and first increased and then decreased,the highest N and Ti atomic percent content ratio was obtained at the grating valve angle of 10°.Surface roughness Ra of TiN thin films showed an increasing trend with the grating valve angle.The highest hardness value and the low wear rate were obtained at the grating valve angle of 10°,which presented the optimal mechanical and wear-resistant properties of TiN films.During film vacuum deposition by arc ion plating,the grating valve angle would affect film performance by influencing gas flow,but it had no significant effect on TiN film structure.By choosing the appropriate grating valve angle,the optimized performance of the thin films would be obtained.关键词
电弧离子镀/光栅阀角度/TiN薄膜/硬度/耐磨性能Key words
arc ion plating/grating valve angle/TiN thin film/hardness/wear-resistant performance分类
通用工业技术引用本文复制引用
赵彦辉,杨文进..光栅阀角度对电弧离子镀TiN薄膜结构及性能的影响[J].沈阳大学学报（自然科学版）,2023,35(6):459-463,470,6.
