光学精密工程2023，Vol.31Issue(24)：3559-3569,11.DOI:10.37188/OPE.20233124.3559
磁性复合流体抛光过程中水分对抛光性能的影响
Influence of water in magnetic compound fluid on polishing performance
摘要
Abstract
Magnetic compound fluids(MCFs)have been shown to exhibit excellent polishing perfor-mance.However,problems with water wastage in MCF slurries during the polishing process can deterio-rate their performance.This increases the costs of polishing using MCF slurries significantly,which sub-stantially limits the application of MCF polishing technology.To address the issue of water loss in an MCF slurry,the relationships between the MCF's water content and the morphology,polishing tempera-ture,normal pressure,and polishing quality of the MCF were investigated.The mechanism of the influ-ence of moisture on polishing quality was also evaluated.First,the influences of different water content levels on the polishing properties of the fluid were analyzed.Additionally,the morphological characteris-tics of the MCF slurry before and after polishing were observed using industrial cameras.Then,the polish-ing mechanism of the MCF with varying water contents was examined by summarizing the internal rela-tionship between temperature increases,the state of the MCF,and the force exerted in the polishing pro-cess as well as the quality of the resulting surface.Finally,the shortened lifespan of the MCF slurry was effectively alleviated by adding water.The following key results were obtained.(1)The initial polishing was better when the water content of the MCF polishing liquid was maintained at 45%.After 10 min of polishing,the surface roughness of the workpiece decreased from 0.410 μm to 0.007 μm using the initial MCF slurry.In contrast,it decreased from 0.576 μm to 0.173 μm using the MCF slurry that had been used for 50 min.The polishing performance of the MCF significantly decreased with increasing polishing time.(2)The ability of the MCF to recover worsened with decreasing water content in the slurry,which in turn affected its polishing performance.(3)The rate of decrease of the roughness of the polished surface after 60 min of polishing increased from 69.97%initially to 86.69%after adding water to the MCF slur-ry.The rate at which material was removed increased from 0.95×108 μm3/min to 1.45×108 μm3/min,and the normal force of the polishing increased from 3.7 N to 4.2 N.When water is added to an MCF slur-ry during the polishing process,maintaining a water content of approximately 45%can improve the long-term stable polishing ability of the slurry and extend the service life of the MCF effectively.关键词
磁性复合流体/抛光温度/抛光性能/表面粗糙度/材料去除率Key words
magnetic compound fluid/polishing temperature/polishing performance/surface rough-ness/material removal rate分类
金属材料引用本文复制引用
王有良,高熙淳,张文娟,郭江..磁性复合流体抛光过程中水分对抛光性能的影响[J].光学精密工程,2023,31(24):3559-3569,11.基金项目
国家自然科学基金资助项目(No.52265056) （No.52265056）
甘肃省科技基金计划资助项目(No.21JR7RA228) （No.21JR7RA228）
兰州理工大学红柳优秀青年人才支持计划资助项目(No.07/062004) （No.07/062004）
