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重离子引起SiC MOSFET栅氧化物潜在损伤研究

于庆奎 张腾 柏松 曹爽 张琛睿 孙毅 梅博 王乾元 王贺 魏志超 张洪伟

原子能科学技术2023,Vol.57Issue(12):2254-2263,10.
原子能科学技术2023,Vol.57Issue(12):2254-2263,10.DOI:10.7538/yzk.2023.youxian.0576

重离子引起SiC MOSFET栅氧化物潜在损伤研究

Latent Gate Oxide Damage in SiC MOSFET Induced by Heavy Ions

于庆奎 1张腾 2柏松 2曹爽 1张琛睿 3孙毅 1梅博 1王乾元 1王贺 1魏志超 1张洪伟1

作者信息

  • 1. 中国空间技术研究院宇航物资保障事业部,北京 100029||国家级抗辐照应用技术创新中心,北京 100029
  • 2. 南京电子器件研究所宽禁带半导体电力电子器件国家重点实验室,江苏南京 211111
  • 3. 中国空间技术研究院宇航物资保障事业部,北京 100029
  • 折叠

摘要

Abstract

The single event effect on SiC MOSFET was studied for space applications.1 200 V SiC MOSFET from four manufactures was irradiated with heavy ions.The ions of carbon(C),germanium(Ge),tantalum(Ta),bismuth(Bi),and uranium(U)were used.The linear energy transfer(LET)of ions was 0.26-118 MeV·cm2/mg.The stat-ic drain-source bias voltage of 50-600 V was applied on the devices under test and the electrical characteristics were measured during irradiation.The post irradiation gate stress(PIGS)test was performed.The experiment results show that single event transient current(SETC)is induced by heavy ions at 50-100 V bias voltage,single event leakage current(SELC)is induced by heavy ions at 200 V bias voltage,and single event burnout is induced by heavy ions at 200-600 V bias voltage.The experiment results confirm that the gate oxide of SiC MOSFET is the most sensitive to single event effect.Biased at about 5%of the rated breakdown voltage,the latent gate oxide damage may be induced by heavy ions.The latent gate oxide damage may further degrade to lead the gate failure during PIGS test.The latent gate oxide damage is the function of incident ion LET and bias voltage,as well as ion fluence,which is a cumulative effect.Depend-ent on the severity of latent gate oxide damage,the gate stress time to trigger gate fail-ure may exceed 300 s.The mechanism of accumulate charge damage was proposed.The electric field in the gate oxide layer increases due to charges generated by the incident ions at different locations.The accumulate damage of gate oxide is caused.It is necessary to evaluate the effect of latent gate oxide damage induced by heavy ions in SiC MOSFETs for single event effect test for space application,the ion fluence used should be calculated based on the orbit and mission period,and the appropriate gate stress time should be evaluated for PIGS test.

关键词

SiC MOSFET/辐射效应/单粒子效应/单粒子烧毁/单粒子栅穿/潜在损伤/辐照后栅应力

Key words

SiC MOSFET/radiation effect/single event effect/single event burnout/single event gate rupture/latent damage/post irradiation gate stress

分类

能源科技

引用本文复制引用

于庆奎,张腾,柏松,曹爽,张琛睿,孙毅,梅博,王乾元,王贺,魏志超,张洪伟..重离子引起SiC MOSFET栅氧化物潜在损伤研究[J].原子能科学技术,2023,57(12):2254-2263,10.

基金项目

国家自然科学基金(12075314) (12075314)

原子能科学技术

OA北大核心CSCDCSTPCD

1000-6931

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