计算技术与自动化2023，Vol.42Issue(4)：9-13,5.DOI:10.16339/j.cnki.jsjsyzdh.202304002
PC控制技术在ALD系统中的应用研究
Application of PC Control Technology in ALD System
摘要
Abstract
Aiming at the problems of poor hardware structure compatibility,weak data exchange and data processing a-bility in current domestic atomic layer deposition(ALD)control system.By analyzing the characteristics of ALD thin film growth process,the hardware components of the system are selected,the system control structure is determined,and the ALD system based on PC control is designed.The system uses Beckhoff industrial PC as the main controller,uses Ether-CAT fieldbus technology to transfer and exchange data between the controller and I/O module,and uses TwinCAT control software to control the operation of the whole system.The field operation results of the new system show that the system has perfect function,strong real-time performance and stable operation,and the process results can meet the semiconductor film process standard.The ALD system based on PC control is of great significance to realize the automation of film growth,and provides guidance for the application of PC control in film growth.关键词
原子层沉积/PC控制/EtherCAT/TwinCATKey words
atomic layer deposition/PC control/EtherCAT/TwinCAT分类
通用工业技术引用本文复制引用
徐硕,张轩雄,明帅强..PC控制技术在ALD系统中的应用研究[J].计算技术与自动化,2023,42(4):9-13,5.基金项目
重大科学仪器设备开发资助项目(2018YFF01012703) （2018YFF01012703）
