太赫兹科学与电子信息学报2024，Vol.22Issue(1)：17-21,5.DOI:10.11805/TKYDA2023289
基于太赫兹真空器件的微型阴极抑制膜特性研究
Study on the characteristics of mini-cathode anti-emission coating based on THz vacuum devices
张敏 1张珂 1杨鹏云1
作者信息
- 1. 中国电子科技集团公司 第十二研究所,北京 100015
- 折叠
摘要
Abstract
In order to meet the demand of THz vacuum devices for miniature electron beam with high current density,a kind of miniature cathode has been prepared by depositing Ta/Zr coating on impregnated scandate cathode surface via dual Ion-Beam-Assisted Deposition(Dual IBAD)and etching an emission zone with a diameter of 100 m via Focus Ion Beam(FIB).Based on the previous study,this paper focuses on the characteristics of anti-emission coating.It is shown in the experimental results that Ta/Zr coating prepared by dual Ion Beam Assisted Deposition(Dual IBAD)can suppress electron emission more effectively and has a longer life time than that prepared by magnetron sputtering.The reasons for the sound anti-emission performance are that composition with high work function is formed in the process of Barium diffusion into the Ta/Zr coating,and that Barium diffusion is effectively suppressed by the high dense Ta/Zr coating.关键词
太赫兹器件/微型阴极/双离子束沉积/Ta/Zr抑制膜Key words
THz vacuum devices/mini cathode/Dual Ion Beam Assisted Deposition/Ta/Zr anti-emission coating分类
信息技术与安全科学引用本文复制引用
张敏,张珂,杨鹏云..基于太赫兹真空器件的微型阴极抑制膜特性研究[J].太赫兹科学与电子信息学报,2024,22(1):17-21,5.
