Anisotropic etching mechanisms of 4H-SiC:Experimental and first-principles insights
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principles/alkali/etching分类
数理科学引用本文复制引用
Guang Yang,Lingbo Xu,Can Cui,Xiaodong Pi,Deren Yang,Rong Wang..Anisotropic etching mechanisms of 4H-SiC:Experimental and first-principles insights[J].Journal of Semiconductors,2024,45(1):P.42-47,6.基金项目
This work is supported by the Natural Science Foundation of China(Grant Nos.62274143&62204216) (Grant Nos.62274143&62204216)
Joint Funds of the Zhejiang Provincial Natural Science Foundation of China(Grant Nos.LHZSD24E020001) (Grant Nos.LHZSD24E020001)
the“Pioneer”and“Leading Goose”R&D Program of Zhejiang(Grant Nos.2022C0102&2023C01010) (Grant Nos.2022C0102&2023C01010)
Partial support was provided by the Leading Innovative and Entrepreneur Team Introduction Program of Hangzhou(Grant No.TD2022012) (Grant No.TD2022012)
Fundamental Research Funds for the Central Universities(Grant No.226-2022-00200) (Grant No.226-2022-00200)
the Natural Science Foundation of China for Innovative Research Groups(Grant No.61721005) (Grant No.61721005)
the Open Fund of Zhejiang Provincial Key Laboratory of Wide Bandgap Semiconductors,Hangzhou Global Scientific and Technological Innovation Center,Zhejiang University. ()