Journal of Semiconductors2024,Vol.45Issue(1):P.38-41,4.DOI:10.1088/1674-4926/45/1/012501
11.2 W/mm power density AlGaN/GaN high electron-mobility transistors on a GaN substrate
Yansheng Hu 1Yuangang Wang 1Wei Wang 1Yuanjie Lv 1Hongyu Guo 1Zhirong Zhang 1Hao Yu 1Xubo Song 1Xingye zhou 1Tingting Han 1Shaobo Dun 1Hongyu Liu 1Aimin Bu 1Zhihong Feng1
作者信息
- 1. National Key Laboratory of Solid-State Microwave Devices and Circuits,Hebei Semiconductor Research Institute,Shijiazhuang 050051,China
- 折叠
摘要
关键词
freestanding GaN substrates/AlGaN/GaN HEMTs/continuous-wave power density/breakdown voltage/Γ-shaped gate分类
信息技术与安全科学引用本文复制引用
Yansheng Hu,Yuangang Wang,Wei Wang,Yuanjie Lv,Hongyu Guo,Zhirong Zhang,Hao Yu,Xubo Song,Xingye zhou,Tingting Han,Shaobo Dun,Hongyu Liu,Aimin Bu,Zhihong Feng..11.2 W/mm power density AlGaN/GaN high electron-mobility transistors on a GaN substrate[J].Journal of Semiconductors,2024,45(1):P.38-41,4.