首页|期刊导航|Journal of Semiconductors|Reliable ferroelectricity down to cryogenic temperature in wakeup free Hf_(0.5)Zr_(0.5)O_(2)thin films by thermal atomic layer deposition
Journal of Semiconductors2024,Vol.45Issue(3):P.33-37,5.DOI:10.1088/1674-4926/45/3/032301
Reliable ferroelectricity down to cryogenic temperature in wakeup free Hf_(0.5)Zr_(0.5)O_(2)thin films by thermal atomic layer deposition
摘要
关键词
hafnia-zirconia solid solution/ferroelectricity/cryogenic temperature/wake-up effect分类
通用工业技术引用本文复制引用
Shuyu Wu,Rongrong Cao,Hao Jiang,Yu Li,Xumeng Zhang,Yang Yang,Yan Wang,Yingfen Wei,Qi Liu..Reliable ferroelectricity down to cryogenic temperature in wakeup free Hf_(0.5)Zr_(0.5)O_(2)thin films by thermal atomic layer deposition[J].Journal of Semiconductors,2024,45(3):P.33-37,5.基金项目
supported by the National Key R&D Program of China under Grant No.2022YFB3608400 ()
National Natural Science Foundation of China under Grant Nos.61825404,61888102,and 62104044 ()
the Strategic Priority Research Program of the Chinese Academy of Sciences under Grant No.XDB44000000 and the project of MOE innovation platform. ()