首页|期刊导航|Journal of Semiconductors|Development of in situ characterization techniques in molecular beam epitaxy
Journal of Semiconductors2024,Vol.45Issue(3):P.9-32,24.DOI:10.1088/1674-4926/45/3/031301
Development of in situ characterization techniques in molecular beam epitaxy
摘要
关键词
epitaxial growth/thin film/in situ characterization/molecular beam epitaxy(MBE)分类
信息技术与安全科学引用本文复制引用
Chao Shen,Wenkang Zhan,Manyang Li,Zhenyu Sun,Jian Tang,Zhaofeng Wu,Chi Xu,Bo Xu,Chao Zhao,Zhanguo Wang..Development of in situ characterization techniques in molecular beam epitaxy[J].Journal of Semiconductors,2024,45(3):P.9-32,24.基金项目
supported by the National Key R&D Program of China(Grant No.2021YFB2206503) (Grant No.2021YFB2206503)
National Natural Science Foundation of China(Grant No.62274159) (Grant No.62274159)
CAS Project for Young Scientists in Basic Research(Grant No.YSBR-056) (Grant No.YSBR-056)
the“Strategic Priority Research Program”of the Chinese Academy of Sciences(Grant No.XDB43010102). (Grant No.XDB43010102)