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基于SiGe BiCMOS的全集成射频功率放大器设计

傅海鹏 项德才

湖南大学学报(自然科学版)2024,Vol.51Issue(2):104-110,7.
湖南大学学报(自然科学版)2024,Vol.51Issue(2):104-110,7.DOI:10.16339/j.cnki.hdxbzkb.2024230

基于SiGe BiCMOS的全集成射频功率放大器设计

Design of Fully Integrated RF Power Amplifier Based on SiGe BiCMOS

傅海鹏 1项德才1

作者信息

  • 1. 天津大学 微电子学院,天津 300072
  • 折叠

摘要

Abstract

A compact fully integrated power amplifier for mobile devices based on the SiGe BiCMOS process is proposed.The design uses a cascode driver stage cascaded with a common emitter power stage to increase the power gain of the amplifier,integrates a CMOS power supply on-chip to provide bias current,and uses distributed ballast resistors and a bias circuit with thermal negative feedback effect to compensate the junction temperature so as to prevent amplifier failure at high-temperature operation.A compact circuit-level thermal coupling model is used to simulate and verify the proposed thermal stabilization measures.The post-simulation results show that PA has an output gain of 32.5 dB in the working range of 2.4~2.5 GHz under a 3.3 V power supply,S11&S22<-10 dB,and the output power at the 1 dB compression point is 25.4 dBm.The maximum junction temperature is less than 65℃(saturation).The chip area is only 1.25×0.76 mm2.The test results show that in the working environment of-45~85℃,the amplifier can work well in the application where the gain requirement is 26.5~32.9 dB.The output power at the 1 dB compression point is 24.3 dBm.Using a 20 MHz 64-QAM OFDM modulation signal test,the output power of DEVM reaching-30 dB is 18.1 dBm.

关键词

功率放大器/异质结双极晶体管/锗硅工艺

Key words

power amplifiers/heterojunction bipolar transistors/SiGe technology

分类

信息技术与安全科学

引用本文复制引用

傅海鹏,项德才..基于SiGe BiCMOS的全集成射频功率放大器设计[J].湖南大学学报(自然科学版),2024,51(2):104-110,7.

基金项目

国家自然科学基金资助项目(62074110),National Natural Science Foundation of China(62074110) (62074110)

国家重点研发计划基金资助项目(2018YFB2202500),National Key Research and Development Program of China(2018YFB2202500) (2018YFB2202500)

湖南大学学报(自然科学版)

OA北大核心CSTPCD

1674-2974

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