电机与控制应用2024，Vol.51Issue(3)：60-68,9.DOI:10.12177/emca.2023.190
磁控溅射用旋转阴极磁场装置的结构设计及磁场分析
Structural Design and Magnetic Field Analysis of a Rotating Cathode Magnetic Field Device for Magnetron Sputtering
摘要
Abstract
To address the problem of uneven cathode magnetic field distribution on the target surface during the coating process of existing magnetron sputtering devices,a new type of rotating cathode magnetic field device is designed.The device drives the magnetic field through a rotating mechanism,and the cam mechanism is used to make the magnetic field to move up and down in a straight line.Firstly,a three-dimensional model of the device is drawn using 3D software.Secondly,a finite element analysis of the magnetic induction intensity of the cathode magnetic field is performed.Finally,the magnetic field is optimized by adjusting the height of the yoke,the length of the extended arm,and the distance between the yoke and the target material,and the numerical simulation curves before and after optimization are compared and analyzed.The results show that the uniformity of the magnetic induction intensity curve of the cathode magnetic field is improved from 21％to 6％after optimization,which effectively improves the uniformity of the magnetic field on the target surface,and beneficial to ensure stable operation of magnetron sputtering.关键词
磁控溅射/旋转阴极磁场/有限元分析/磁场均匀性Key words
magnetron sputtering/rotating cathode magnetic field/finite element analysis/magnetic field uniformity分类
信息技术与安全科学引用本文复制引用
吴纯恩,安辉,宿泽达,陆艳君,邓文宇,齐丽君,安跃军..磁控溅射用旋转阴极磁场装置的结构设计及磁场分析[J].电机与控制应用,2024,51(3):60-68,9.基金项目
沈阳市重点技术攻关"揭榜挂帅"项目(22-316-1-02)Shenyang Key Technology Research and Development Open Bidding for Selecting the Best Candidates Project(22-316-1-02) （22-316-1-02）
