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Laser manufacturing of spatial resolution approaching quantum limit

Xiao-Jie Wang Hong-Hua Fang Zhen-Ze Li Dan Wang Hong-Bo Sun

光:科学与应用(英文版)2024,Vol.13Issue(3):421-428,8.
光:科学与应用(英文版)2024,Vol.13Issue(3):421-428,8.DOI:10.1038/s41377-023-01354-5

Laser manufacturing of spatial resolution approaching quantum limit

Laser manufacturing of spatial resolution approaching quantum limit

Xiao-Jie Wang 1Hong-Hua Fang 1Zhen-Ze Li 1Dan Wang 2Hong-Bo Sun3

作者信息

  • 1. State Key Laboratory of Precision Measurement Technology and Instruments,Department of Precision Instrument,Tsinghua University,Beijing 100084,China
  • 2. State Key Laboratory of Integrated Optoelectronics,College of Electronic Science and Engineering,Jilin University,2699 Qianjin Street,Changchun 130012,China
  • 3. State Key Laboratory of Precision Measurement Technology and Instruments,Department of Precision Instrument,Tsinghua University,Beijing 100084,China||State Key Laboratory of Integrated Optoelectronics,College of Electronic Science and Engineering,Jilin University,2699 Qianjin Street,Changchun 130012,China
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摘要

引用本文复制引用

Xiao-Jie Wang,Hong-Hua Fang,Zhen-Ze Li,Dan Wang,Hong-Bo Sun..Laser manufacturing of spatial resolution approaching quantum limit[J].光:科学与应用(英文版),2024,13(3):421-428,8.

基金项目

The authors acknowledge the financial support from the National Natural Science Foundation of China(No.62075115,62335013)and the National Key R&D Program of China(No.2022YFB4600400). (No.62075115,62335013)

光:科学与应用(英文版)

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