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Effect of annealing on the electrical performance of N-polarity GaN Schottky barrier diodes

Nuo Xu Gaoqiang Deng Haotian Ma Shixu Yang Yunfei Niu Jiaqi Yu Yusen Wang Jingkai Zhao Yuantao Zhang

半导体学报(英文版)2024,Vol.45Issue(4):48-55,8.
半导体学报(英文版)2024,Vol.45Issue(4):48-55,8.DOI:10.1088/1674-4926/45/4/042501

Effect of annealing on the electrical performance of N-polarity GaN Schottky barrier diodes

Effect of annealing on the electrical performance of N-polarity GaN Schottky barrier diodes

Nuo Xu 1Gaoqiang Deng 1Haotian Ma 1Shixu Yang 1Yunfei Niu 1Jiaqi Yu 1Yusen Wang 1Jingkai Zhao 1Yuantao Zhang1

作者信息

  • 1. State Key Laboratory of Integrated Optoelectronics,College of Electronic Science and Engineering,Jilin University,Changchun 130012,China
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摘要

关键词

nitrogen polarity/GaN/Schottky barrier diodes/annealing/interface state

Key words

nitrogen polarity/GaN/Schottky barrier diodes/annealing/interface state

引用本文复制引用

Nuo Xu,Gaoqiang Deng,Haotian Ma,Shixu Yang,Yunfei Niu,Jiaqi Yu,Yusen Wang,Jingkai Zhao,Yuantao Zhang..Effect of annealing on the electrical performance of N-polarity GaN Schottky barrier diodes[J].半导体学报(英文版),2024,45(4):48-55,8.

基金项目

This work was supported by the National Key R&D Pro-gram of China(Nos.2022YFB3605205,2021YFB3601000,and 2021YFB3601002),the National Natural Science Foundation of China(Nos.U22A20134,62074069,62104078,and 62104079),and the Science and Technology Developing Project of Jilin Province(Nos.20220201065GX,20230101053JC,and 20220101119JC). (Nos.2022YFB3605205,2021YFB3601000,and 2021YFB3601002)

半导体学报(英文版)

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1674-4926

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