高等学校化学学报2024，Vol.45Issue(5)：46-54,9.DOI:10.7503/cjcu20240056
基于阿伏苯宗-阿魏酸的光释放与抗氧化性能
Photorelease and Antioxidant Activity of Avobenzone-Ferulic Acid
摘要
Abstract
Ferulic acid is an effective antioxidant that is widely used in the cosmetics due to its ability to resist oxidative stress and delay skin aging.However,its photosensitivity challenges its application.In order to overcome this limitation,we developed a binary molecule composed of avobenzone(AB)and ferulic acid(FA).This design is based on the existence of photoremovable benzoyl methyl in the avobenzone to protect ferulic acid from photodamage and maintain its antioxidant activity.The results showed that FA was successfully released,and AB had an effectively photoprotective effect on FA.In vitro experiments showed that AB-FA molecules and their photolysis products had significant activity of scavenging free radical,while cell experiments confirmed their low cytotoxicity and excellent ability to reactive oxygen species(ROS)scavenging.关键词
阿伏苯宗/光保护/清除自由基活性Key words
Avobenzone/Photoprotection/Free radical scavenging activity分类
化学化工引用本文复制引用
张天龙,陈光..基于阿伏苯宗-阿魏酸的光释放与抗氧化性能[J].高等学校化学学报,2024,45(5):46-54,9.基金项目
国家自然科学基金(批准号:22174090)、陕西省自然科学基础研究计划项目(批准号:2022JM-089)、陕西省高层次人才创新长期项目(陈光)和国家外国专家计划高端项目(批准号:G2021041002L)资助. Supported by the National Natural Science Foundation of China(No.22174090),the Natural Science Basic Research Program of Shaanxi Province,China(No.2022JM-089),the Shaanxi Province High-level Talent Innovation Long-term Project(Chen Guang),China and the National Foreign Ex-perts Plan High-end Project,China(No.G2021041002L). （批准号:22174090）
