金刚石与磨料磨具工程2024，Vol.44Issue(2)：151-160,10.DOI:10.13394/j.cnki.jgszz.2023.0071
掺硼浓度与沉积气压对Ti/BDD微观结构和电化学氧化性能影响规律研究
Effect of boron concentration and gas pressure on the electrochemical oxidation performance changes of HFCVD diamond films on Ti substrates
摘要
Abstract
The effects of boron concentration and deposition pressure on the microstructure and electrochemical oxida-tion performance of Ti/BDD electrodes during HFCVD growth were systematically investigated.The electrode's sur-face morphology,composition,and electrochemical performance were characterized by scanning electron microscope(SEM),Raman spectroscopy,ultraviolet spectrophotometry,and an electrochemical workstation.Tetracycline served as a simulated pollutant to evaluate the electrochemical oxidation degradation performance of BDD electrodes fabricated with different boron concentrations and deposition pressures.As air pressure increases,the grain quality of the diamond gradually decreases,yet boron atom doping enhances the grain quality of the diamond.Under high boron concentration and low pressure conditions,the boron atom concentration on the diamond film's surface is elevated.BDD electrodes with larger grain sizes and higher boron atom concentrations,prepared under these conditions,exhibit superior electro-chemical performance,increased degradation efficiency,and reduced degradation energy consumption.关键词
钛基硼掺杂金刚石薄膜电极/电化学氧化/掺硼浓度/沉积气压/四环素Key words
boron doped diamond electrode/electrochemical oxidation/boron concentration/gas pressure/tetracycline分类
矿业与冶金引用本文复制引用
刘典宏,尹钊,陈峰磊,马莉,李静,魏秋平..掺硼浓度与沉积气压对Ti/BDD微观结构和电化学氧化性能影响规律研究[J].金刚石与磨料磨具工程,2024,44(2):151-160,10.基金项目
国家"十四五"重点研究发展计划(2021YFB3701800) （2021YFB3701800）
国家自然科学基金(52071345,51874370,51601226) （52071345,51874370,51601226）
广东省"十三五"重点研究开发项目(2020B01085001) （2020B01085001）
湖南省高新技术产业科技创新引领计划(2022GK4037,2022GK4047). （2022GK4037,2022GK4047）
