化工学报2024，Vol.75Issue(4)：1705-1717,13.DOI:10.11949/0438-1157.20231414
新型锑氧簇光刻胶的性能与机理研究
Performance and mechanism of novel antimony oxo cluster photoresist
摘要
Abstract
With the increasing integration of semiconductor industry,higher requirements are put forward for lithographic materials.In recent years,metal-oxygen oxo clusters(MOCs)photoresists have been widely studied due to the small size and flexible structure design.At present,antimony-based photoresistsare limited to antimony-containing complexes.In this paper,a novel antimony-oxygen oxo cluster photoresist was developed,and the advantages of the self-assembly strategy was demonstrated by comparing the solubility difference between metal-organic assembled Sb4O-1 and self-assembled Sb4O-2.Atomic force microscopy(AFM)confirmed that Sb4O-2 photoresists can form smooth films with a low roughness value(root mean square roughness＜0.3 nm).Electron beam lithography(EBL)demonstrated the excellent patterning ability of Sb4O-2 photoresist(line width＜50 nm),and theoretical calculations supported a novel self-assembled Sb4O-2"ligand dissociation"mechanism analyzed by X-ray photoelectron spectroscopy(XPS).This work inspired the exploration of additional metal oxygen oxo cluster materials.关键词
锑氧簇/自组装/光刻胶/理论计算/电子束光刻/成像/溶解性/纳米材料Key words
antimony oxo cluster/self-assembly/photoresist/theoretical calculations/electron beam lithography/imaging/solubility/nanomaterials分类
化学化工引用本文复制引用
司友明,郑凌峰,陈鹏忠,樊江莉,彭孝军..新型锑氧簇光刻胶的性能与机理研究[J].化工学报,2024,75(4):1705-1717,13.基金项目
国家自然科学基金项目(21925802,22338005) （21925802,22338005）
辽宁滨海实验室(LBLB-2023-03) （LBLB-2023-03）
中央高校基本科研业务费专项资金(DUT22LAB601) （DUT22LAB601）
