工业工程2024，Vol.27Issue(3)：12-21,30,11.DOI:10.3969/j.issn.1007-7375.240100
基于门控循环单元强化学习的晶圆光刻区实时调度方法研究
Real-time Scheduling of Wafer Photolithography Area Based on Reinforcement Learning with Gated Recurrent Unit
摘要
Abstract
To address the scheduling problem of wafer photolithography area,characterized by dynamic nature,real-time requirements,multiple constraints,and multiple objectives,a real-time scheduling method based on gated recurrent unit(GRU)reinforcement learning is proposed.This method incorporates GRU to learn the temporal information of historical scheduling decisions and states in the photolithography area,providing auxiliary decision-making information for the double deep reinforcement learning(DDRL)model.The input state space and output action set of the DDRL model are designed,and a multi-objective reward function is established with the objective of minimizing the maximum completion time of wafers and maximizing the on-time delivery rate,optimizing the scheduling output by intelligent agents.Additionally,constraint relaxation rules and scheduling methods are proposed combining equipment-specific constraints and mask constraints,to enhance the practicality of scheduling strategies.Through empirical evaluation using real-world cases from a wafer manufacturing enterprise,this method is compared with traditional double deep reinforcement learning and heuristic rule methods for photolithography area,demonstrating its superiority and verifying its effectiveness in solving this problem.关键词
晶圆制造系统/光刻区调度/深度强化学习/门控循环单元(GRU)/多目标Key words
wafer fabrication system/scheduling of photolithography area/deep reinforcement learning/gated recurrent unit(GRU)/multi-objective分类
管理科学引用本文复制引用
吴立辉,石津铭,金克山,张洁..基于门控循环单元强化学习的晶圆光刻区实时调度方法研究[J].工业工程,2024,27(3):12-21,30,11.基金项目
国家重点研发资助项目(2022YFB3305003) （2022YFB3305003）
上海应用技术大学引进人才科研启动项目(YJ2022-33) （YJ2022-33）
