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Dual-phase coexistence enables to alleviate resistance drift in phase-change films

Tong Wu Chen Chen Jinyi Zhu Guoxiang Wang Shixun Dai

半导体学报（英文版）2024，Vol.45Issue(7)：54-59,6.

半导体学报（英文版）2024，Vol.45Issue(7)：54-59,6.DOI:10.1088/1674-4926/24040013

Dual-phase coexistence enables to alleviate resistance drift in phase-change films

Tong Wu ¹Chen Chen ¹Jinyi Zhu ¹Guoxiang Wang ²Shixun Dai²

作者信息

1. Laboratory of Infrared Materials and Devices,The Research Institute of Advanced Technologies,Ningbo University,Ningbo 315211,China
2. Laboratory of Infrared Materials and Devices,The Research Institute of Advanced Technologies,Ningbo University,Ningbo 315211,China||Institute of Ocean Engineering,Ningbo University,Ningbo 315211,China
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摘要

关键词

phase change films/X-ray methods/resistance drift/optical band gap

Key words

phase change films/X-ray methods/resistance drift/optical band gap

引用本文复制引用

Tong Wu,Chen Chen,Jinyi Zhu,Guoxiang Wang,Shixun Dai..Dual-phase coexistence enables to alleviate resistance drift in phase-change films[J].半导体学报（英文版）,2024,45(7):54-59,6.

基金项目

This work was financially supported by the National Natural Science Foundation of China(Grant No.62074089),the Natural Science Foundation of Ningbo City,China(Grant No.2022J072),the Youth Science and Technology Innovation Leading Talent Project of Ningbo City,China(Grant No.2023QL005)and was sponsored by the K.C.Wong Magna Fund in Ningbo University. （Grant No.62074089）

半导体学报（英文版）

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ISSN：1674-4926

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