首页|期刊导航|半导体学报(英文版)|Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing

Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealingOACSTPCDEI

Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing

Siyi Huang;Masao Ikeda;Feng Zhang;Minglong Zhang;Jianjun Zhu;Shuming Zhang;Jianping Liu

School of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China||Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSuzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSuzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSchool of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China||Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSuzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSchool of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China||Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,ChinaSchool of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China||Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China||Key Laboratory of Nanodevices and Applications,Chinese Academy of Sciences,Suzhou 215123,China

p-GaNhole concentrationelectrical propertiesannealingionization energy

p-GaNhole concentrationelectrical propertiesannealingionization energy

《半导体学报(英文版)》 2024 (8)

75-82,8

This work was supported by the National Natural Science Foundation of China(62150710548,61834008,U21A20493),the National Key Research and Development Program of China(2022YFB2802801),the Key Research and Development Program of Jiangsu Province(BE2021008-1),the Suzhou Key Laboratory of New-type Laser Display Technol-ogy(SZS2022007),the Natural Science Foundation of Jiangsu Province(BK20232042).We are thankful for the technical support from Nano Fabri-cation Facility,Platform for Characterization & Test,and Nano-X of SINANO,CAS.

10.1088/1674-4926/24010017

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