Efficient guiding and focusing of intense laser pulse using periodic thin slitsOA
Efficient guiding and focusing of intense laser pulse using periodic thin slits
L.Xu;T.W.Huang;K.Jiang;C.N.Wu;H.Peng;P.Chen;R.Li;H.B.Zhuo;C.T.Zhou
Shenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of ChinaShenzhen Key Laboratory of Ultraintense Laser and Advanced Material Technology,Center for Intense Laser Application Technology,and College of Engineering Physics,Shenzhen Technology University,Shenzhen 518118,People's Republic of China
《极端条件下的物质与辐射（英文）》 2024 (4)
29-39,11
This work is supported by the National Key R&D Pro-gram of China(Grant No.2022YFA1603300)and the National Natural Science Foundation of China(Grant Nos.12175154,12205201,12005149,and 11975214).T.W.H.acknowledges support from the Shenzhen Science and Technology Program(Grant No.RCYX20221008092851073).The EPOCH code is used under UK EPSRC Contract Nos.EP/G055165/1 and EP/G056803/1.
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