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NH3/N2复合热退火技术改善高浓度Mg掺杂GaN材料性能

蒋宗霖 闫丹 张宁 魏同波 王军喜 魏学成

发光学报2024,Vol.45Issue(8):1325-1333,9.
发光学报2024,Vol.45Issue(8):1325-1333,9.DOI:10.37188/CJL.20240130

NH3/N2复合热退火技术改善高浓度Mg掺杂GaN材料性能

Enhanced Properties of Heavily Mg-doped GaN by Combining Thermal Annealing Processes in NH3/N2

蒋宗霖 1闫丹 2张宁 2魏同波 1王军喜 1魏学成1

作者信息

  • 1. 中国科学院半导体研究所宽禁带半导体研发中心,北京 100083||中国科学院大学材料科学与光电技术学院,北京 100049
  • 2. 中国科学院半导体研究所宽禁带半导体研发中心,北京 100083
  • 折叠

摘要

Abstract

The effect of a novel post-growth process,i.e.high-temperature thermal annealing process in NH3,on the crystal quality,luminescence property,and electrical conductivity of the heavily Mg-doped GaN was studied.The experimental results showed that,compared with the traditional high-temperature annealing process in N2,the high-temperature thermal annealing process in NH3 can improve crystal quality in the heavily Mg-doped GaN,while promote the further effective doping of Mg acceptors,resulting in an enhancement of the intensity of the blue luminescence band in its photoluminescence spectra.The heavily Mg-doped GaN with sig-nificantly lower background electron concentration was obtained by combining high-temperature thermal anneal-ing process in NH3 with low-temperature thermal annealing process in N2.This is because that the thermal de-composition products of NH3 in the post-growth process can effectively reduce the concentration of shallow do-nor-type defects such as N vacancies and interstitial Ga atoms in the material,ultimately improving electrical conductivity of the heavily Mg-doped GaN.

关键词

氮化镓/Mg掺杂/热退火工艺/氨气

Key words

gallium nitride/Mg doped/thermal annealing/ammonia

分类

数理科学

引用本文复制引用

蒋宗霖,闫丹,张宁,魏同波,王军喜,魏学成..NH3/N2复合热退火技术改善高浓度Mg掺杂GaN材料性能[J].发光学报,2024,45(8):1325-1333,9.

基金项目

国家重点研发计划(2022YFF0705600) (2022YFF0705600)

国家自然科学基金(62135013)Supported by National Key R&D Program of China(2022YFF0705600) (62135013)

National Natural Science Foundation of China(62135013) (62135013)

发光学报

OA北大核心CSTPCD

1000-7032

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