首页|期刊导航|Journal of Semiconductors|Single-fundamental-mode cryogenic(3.6 K)850-nm oxideconfined VCSEL
Journal of Semiconductors2024,Vol.45Issue(10):P.69-73,5.DOI:10.1088/1674-4926/24070025
Single-fundamental-mode cryogenic(3.6 K)850-nm oxideconfined VCSEL
摘要
关键词
VCSEL/cryogenic temperature/cryogenic computing/optical interconnect分类
信息技术与安全科学引用本文复制引用
Anjin Liu,Chenxi Hao,Jingyu Huo,Hailong Han,Minglu Wang,Bao Tang,Lingyun Li,Lixing You,Wanhua Zheng..Single-fundamental-mode cryogenic(3.6 K)850-nm oxideconfined VCSEL[J].Journal of Semiconductors,2024,45(10):P.69-73,5.基金项目
supported by the National Natural Science Foundation of China(Nos.62275243,62075209,and 61675193) (Nos.62275243,62075209,and 61675193)
the Beijing Natural Science Foundation(No.Z200006). (No.Z200006)