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光栅干涉精密纳米测量技术OA北大核心CSTPCD

Grating interferometric precision nanometric measurement technology

中文摘要英文摘要

光栅干涉测量是一种重要的精密纳米测量技术,具有高分辨率、高抗干扰能力和多自由度扩展的优势,在先进节点光刻机、超精密机床等场景中发挥着至关重要的作用.对比介绍了光栅干涉、激光干涉与时栅测量技术,明确其应用场景和当前性能参数,阐述了光栅干涉测量中的零差和外差两种技术原理,并在此基础上分析了光栅干涉仪的国内外发展动态,包括代表性的设备厂商,和近年来国内外在纳米及亚纳米精度的单、多自由度系统方面的研究开发情况.进一步地,对光栅干涉测量的精度和误差进行了分析与讨论,介绍了误差来源、分类及针对性的补偿方法.最后,对光栅干涉仪的发展现状及未来前景进行了讨论,期望为光栅干涉仪系统的开发和优化提供参考.

Grating interferometry is a crucial technology in precision nanometrology,valued for its high resolution,robustness,and adaptability for multi-axis measurement systems.It is essential in advanced semiconductor manufacturing and ultra-precision machine tools.This review first compares grating interfer-ometry with laser interferometry and time grating,detailing their applications and performance.It then ex-plains the two main principles:homodyne and heterodyne grating interferometry.The review also analyzes global development trends,highlighting key manufacturers and advancements in achieving nanometric to sub-nanometric precision in single and multi-axis systems.In addition,it examines error sources,classifica-tions,and compensation methods in grating interferometry.Finally,it discusses the current state and fu-ture prospects of grating interferometers,offering insights for developing and optimizing measurement sys-tems based on this technology.

李星辉;崔璨

清华大学 深圳国际研究生院,广东 深圳 518055||清华大学 清华-伯克利深圳学院,广东 深圳 518055清华大学 深圳国际研究生院,广东 深圳 518055

机械工程

精密测量纳米测量光栅干涉仪多自由度误差补偿

precision measurementnano measurementgrating interferometermultiple degrees of free-domerror compensation

《光学精密工程》 2024 (017)

2591-2611 / 21

广东省基础与应用基础研究基金资助项目(No.2021B1515120007);深圳市稳定支持计划项目(No.WDZC20231124201906001);国家自然科学基金资助项目(No.62275142)

10.37188/OPE.20243217.2591

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